The WIS1100 is designed to handle 4" and 6" wafer sizes for optical inspection, wafer mapping and defect classification management in the semiconductor industry. The system is equipped with high-performance front and rear wafer macro inspection systems, including micro inspection systems. In addition, the microscopic inspection system integrates Nikon Eclipse L200N and 5 motorized objective lenses. The wafer aligner is to ensure the accuracy of wafer centering and positioning before unloading, and the OCR reader is used for mapping retrieval from the host server to improve processing efficiency.
WIS1100 - the first optical inspection system
-
Designed for 4" and 6" wafers
-
Micro and macro inspection (including back macro inspection)
-
Brightfield, Darkfield and NIC Mode
-
Motorized mirror changer with 5 objectives (2.5x, 5x, 10x, 20x, 50x)
-
Integrated Wafer Ion Neutralizer and Programmable XY Index
-
Wafer alignment and wafer mapping are available
-
User Defined Rejection Code and Post Inspection Summary Lot Report
-
Integrated inkjet marking machine for blemish marking (optional)
-
Software user interface with recipe control module, wafer map, cassette map and microscope component control.
-
TCP-IP and RS232 data interface/SECS/GEM data communication (optional)
-
